Abstract
This document, produced with the assistance of ChatGPT o3 and ChatGPT 5 Thinking, is released under the Apache 2.0 licence. It is a voluntary defensive publication and therefore enters the prior art upon release under the applicable patent statutes: EPC Art. 54(2) (European Patent Convention), French IPC Art. L 611-11 (French Intellectual Property Code), 35 U.S.C. §102(a) (United States Patent Act), Chinese Patent Law Art. 22(5) (中华人民共和国专利法), and Japanese Patent Act Art. 29(1) (特許法). This work discloses enabling concepts for orbital fabrication and in-situ repair: holo-atomic micro-g printing, real-time diffractive AI control, and a nano-plasma Patch-Healer torch, plus 12+ hybrid hooks (gas shroud micro-atmosphere, ultrasonic melt-pool damping, microchannel-cooled deformable mirror, inline LIBS/TDLAS, retrodirective alignment, cryogenic plume capture, etc.). Every proposal is described in an enabling manner, classified with IPC and CPC codes, and accompanied by timestamp proof (RFC 3161 / FreeTSA). Original publication on Zenodo : https://zenodo.org/records/16785955
Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 License.
Recommended Citation
Pillet, Xavier, "Open Void-Fab Stack: Holo-Atomic Micro-g Printing, Real-Time Di!ractive AI, and Nano-Plasma Patch-Healing", Technical Disclosure Commons, (August 11, 2025)
https://www.tdcommons.org/dpubs_series/8452