Abstract
This publication describes a method for improving the reliability of metrology for characterizing an optical system in augmented reality and virtual reality devices. The method uses pattern mapping based on a reference pattern to detect regions of interest. This pattern mapping approach eliminates the need for repetitive, parameter-sensitive image preprocessing to locate an ROI in an image and enables highly consistent optical metrology across different testers and devices (e.g., displays).
Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 License.
Recommended Citation
Hu, Zhenxing; Ma, Qianli; Karbasi, Ali; Hu, Wenchun; and Yang, Jun, "Reference Pattern Mapping for Metrology of Augmented Reality and Virtual Reality Devices", Technical Disclosure Commons, (July 28, 2026)
https://www.tdcommons.org/dpubs_series/11161