Inventor(s)

Jon BillsFollow

Abstract

To enlarge the field-of-illumination (FOI), we propose a monolithic emitter solution, where we add the beamshaping functions directly over the light emitters (LED or laser) thorough nano/micro patterning approaches. The typical LED or laser emitter may have a flat finish surface (semiconductor material or some anti-reflection coating layers). In our proposal, we consider directly patterning beamshaping components onto the coating layer or semiconductor material through semiconductor lithography and etch process. Alternative approach may pattern the beamshaping components via imprint or other additive nano/micro manufacturing processes. One advantage to this solution is that the beamshaping function can be engineered to control properly the power distribution over the emitted angle range to facilitate the operation of imaging system.

Creative Commons License

Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 License.

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