This disclosure describes crystallographic etching techniques to manufacture blazed or slanted silicon gratings such that their characteristic angles are defined by the facet angles of the silicon crystal substrate. The techniques enable the manufacture of precisely formed and uniform gratings with smooth surfaces over large areas. The grating pattern is achieved by using anisotropic, potassium hydroxide based, crystallographic etching of a silicon wafer along selected crystal planes. The grating structures manufactured by the described techniques can be used as master molds for replicated fabrication of nano-imprint optical devices such as waveguides.
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Tian, Lu; Lowney, Joe; Mercier, Tom; and Jin, Wei, "Blazed and Slanted Grating Mastering using Crystallography-based Silicon Etching", Technical Disclosure Commons, (August 24, 2022)